[Qnfcf-oxford-metalrie] New cleaning procedure for metal-RIE

[Lino Eugene]

Dear users,

It has been noticed that several users did not report the issues with the OPT-CLEAN O2/SF6 and the OPT-CLEAN O2+O2/SF6 in Badger and preferred to use the cleaning recipe defined by Rod.

As a friendly reminder, any problem must be reported in Badger even if it is reported directly to a staff member.

The OPT-CLEAN O2/SF6 and OPT-CLEAN O2/SF6 have been improved. The software showed low reflected power but the plasma glowing discharge was faint through the view port. Now the glowing discharge can be clearly seen.

It has been reported that the OPT-CLEAN O2/Cl2 makes the wafer dirty. Actually, micromasking occurs because of non-volatile products and black silicon is seen on the wafer. It is called black Silicon because light is not reflected anymore. This is normal and expected when Cl2 is used. https://pubs.rsc.org/en/content/articlehtml/2014/ee/c4ee01152j#cit122

Please use the cleaning recipes recommended par Oxford Instruments. If there is any issue, then we can report it to them.

Thanks for your collaboration.

Best,

Lino Eugene, P.Eng., Ph.D.,
Micro/nanofabrication process engineer
Quantum-Nano Fabrication and Characterization Facility
QNC 1611
University of Waterloo
200 University Avenue West
Waterloo, ON, Canada
N2L 3G1

Ph: +1 519-888-4567 #37788
Cell: +1 226-929-1685
Website: https://fab.qnc.uwaterloo.ca/

From: Lino Eugene
Sent: July 31, 2019 12:16 PM
To: qnfcf-oxford-metalrie at lists.uwaterloo.ca; Yunhan Li <liyunhan88 at hotmail.com>; Ehsan Fathi <efathi at uwaterloo.ca>; Xiaoli Zhu <xiaoli.zhu at uwaterloo.ca>; p.charles at utoronto.ca; Bilal Janjua <bilal.janjua at utoronto.ca>; Yaoze Liu <y953liu at uwaterloo.ca>; Wissal Alayashi <walayashi at vuereal.com>; Charles Lin <charleschihchin.lin at mail.utoronto.ca>; Long Pu <lpu at uwaterloo.ca>; Hossein Zamani <hzamanis at uwaterloo.ca>; Yan Li <y2554li at uwaterloo.ca>; trevorjamesstirling at gmail.com; Arjun Shetty <arjun.shetty at uwaterloo.ca>; HoSung Kim <hosung.kim at uwaterloo.ca>; Huseyin Ekinci <huseyin.ekinci at uwaterloo.ca>; a22pan at edu.uwaterloo.ca; Tejinder Singh <tejinder.singh at uwaterloo.ca>; Siyi Wang <s535wang at uwaterloo.ca>; Mohsen Asad <mohsen.asad at uwaterloo.ca>; j43jiang at uwaterloo.ca; c48xu at uwaterloo.ca; Shazzad Rassel <shazzad.rassel at uwaterloo.ca>; Burak Tekcan <btekcan at uwaterloo.ca>; goosneyc at mcmaster.ca; Eric Liu <g37liu at uwaterloo.ca>; Ripon Dey <rdey at uwaterloo.ca>; i2cho at uwaterloo.ca; Ariel Petruk <apetruk at uwaterloo.ca>; msamaan at uwaterloo.ca; pranav at vuereal.com; Rabiul Islam <r25islam at uwaterloo.ca>
Cc: Nathan Nelson - Fitzpatrick <nnelsonfitzpatrick at uwaterloo.ca>; Matthew Scott <m33scott at uwaterloo.ca>; Rodello Salandanan <rodello.salandanan at uwaterloo.ca>
Subject: New cleaning procedure for metal-RIE

Dear users,

As continuous improvement, we have updated the cleaning procedure for metal-RIE. In addition to the O2/SF6 cleaning recipe, there are now SF6+O2/SF6 and Cl2/SF6 cleaning recipes as recommended per Oxford Instruments.

When BCl3 is the main etch gas, SF6 cleaning should be done first as oxygen will oxidize the coating on the chamber sidewalls and makes it harder to remove. When GaAs is etched, Cl2/SF6 cleaning is recommended.

Please find attached a table with all the OPT recipes available in the metal-RIE and the cleaning recipes to be used. This table is also attached to the tool. The name of cleaning recipes start with OPT - CLEAN for fast identification in the recipe list. If a recipe is not listed, let us know and we will update the table.

Hopefully, these modifications will improve process repeatability. Please let us know if you have questions.

Best,

Lino Eugene, P.Eng., Ph.D.,
Micro/nanofabrication process engineer
Quantum Nano-Fabrication and Characterization Facility
QNC 1611
University of Waterloo
200 University Avenue West
Waterloo, ON, Canada
N2L 3G1

Ph: +1 519-888-4567 #37788
Cell: +1 226-929-1685
Website: https://fab.qnc.uwaterloo.ca/



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